Colbert Lu
RD Deputy Director at Photronics DNP Semiconductor Mask Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Photomasks, Optical proximity correction

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10451, Photomask Technology
KEYWORDS: Lithography, Inspection, 3D modeling, Scanning electron microscopy, Photoresist materials, Near field, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | October 4, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Lithography, Manufacturing, Scanning electron microscopy, Photomasks, Source mask optimization, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Edge roughness, Holons

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Reticles, Image registration, Pellicles, Photomasks, Double patterning technology, Source mask optimization, Semiconducting wafers, Overlay metrology, 193nm lithography

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Reticles, Etching, Air contamination, Chromium, Scanning electron microscopy, Photomasks, Lutetium, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Etching, Quartz, Manufacturing, Inspection, Atomic force microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

Showing 5 of 8 publications
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