Dr. Colin J. Brodsky
Development Engineer at
SPIE Involvement:
Author
Publications (19)

PROCEEDINGS ARTICLE | March 29, 2013
Proc. SPIE. 8682, Advances in Resist Materials and Processing Technology XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Etching, Digital filtering, Chemistry, Manufacturing, Optics manufacturing, Yield improvement, Back end of line

SPIE Journal Paper | March 19, 2012
JM3 Vol. 11 Issue 1
KEYWORDS: SRAF, Printing, Optical proximity correction, Optical lithography, Critical dimension metrology, Etching, Logic, Photomasks, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 23, 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Optical lithography, Etching, Photomasks, Double patterning technology, Optical proximity correction, SRAF, Critical dimension metrology, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Optical lithography, Scanners, Error analysis, Electroluminescence, Photomasks, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 7, 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Wafer-level optics, Optical lithography, Imaging systems, Sensors, Calibration, Metals, Error analysis, Image resolution, Interferometry, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Metrology, Optical lithography, Imaging systems, Image processing, Microelectronics, Spatial resolution, Semiconducting wafers, Pulsed laser operation, Chemical engineering, Wafer testing

Showing 5 of 19 publications
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