Cong Zhang
at Shanghai Huali Integrated Circuit Corp.
SPIE Involvement:
Publications (7)

SPIE Journal Paper | 4 November 2022
JM3, Vol. 21, Issue 04, 041605, (November 2022)
KEYWORDS: Etching, System on a chip, Image processing, Sensors, Lithography, Semiconducting wafers, Distance measurement, Process control, Transistors, Signal to noise ratio

SPIE Journal Paper | 19 September 2022
JM3, Vol. 21, Issue 03, 034001, (September 2022)
KEYWORDS: Polarization, Diffraction gratings, Diffraction, Scanning electron microscopy, Overlay metrology, Etching, Metrology, Optical testing, Lithography, Image processing

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530D (2022)
KEYWORDS: Overlay metrology, Double patterning technology, Edge roughness, Scanning electron microscopy, Manufacturing, Line width roughness, Line edge roughness, Integrated circuits, Electron microscopy, Critical dimension metrology

Proceedings Article | 19 August 2021 Presentation + Paper
Yu Zhang, Biqiu Liu, Cong Zhang, Yuyang Bian, Song Gao, Yifei Zhu, Xiaobo Guo, Jun Huang, Yaniv Abramovitz, Qiang Zhou, Uri Smolyan, Omri Baum, Shmuel Ben Nissim, Alexander Vipolzov
Proceedings Volume 11611, 116111X (2021)
KEYWORDS: Overlay metrology, Instrument modeling, Semiconducting wafers, Measurement devices, Wafer-level optics, Mathematical modeling, Yield improvement, Etching, Optical testing, Data modeling

Proceedings Article | 22 February 2021 Poster + Presentation + Paper
Proceedings Volume 11611, 1161134 (2021)
KEYWORDS: Lithography, Reflectivity, Scanning electron microscopy, Silicon, Photoresist materials, Line width roughness, Semiconducting wafers, Etching, Coating

Showing 5 of 7 publications
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