Corey R. Struck
at Univ of Illinois
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconductors, Argon, Sputter deposition, Image processing, Ions, Scanning electron microscopy, Photoresist materials, Ion beams, Line width roughness, Line edge roughness

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Argon, Sputter deposition, Ions, Scanning electron microscopy, Photoresist materials, Ion beams, Line width roughness, Line edge roughness, Grazing incidence

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