Dr. Cornel Bozdog
at Nova Measuring Instruments Inc
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Publications (23)

SPIE Journal Paper | October 25, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Semiconducting wafers, Metrology, Optical lithography, Scatterometry, Critical dimension metrology, Finite element methods, Scatter measurement, Diffractive optical elements, Transmission electron microscopy, Reactive ion etching

PROCEEDINGS ARTICLE | March 30, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Diffractive optical elements, Etching, Transmission electron microscopy, Scatterometry, Process control, Critical dimension metrology, Reactive ion etching, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Multilayers, Metrology, Optical lithography, Metals, Germanium, Gallium arsenide, Silicon, Scatterometry, Semiconducting wafers, Nanowires

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Optical lithography, Diffractive optical elements, Etching, Transmission electron microscopy, Scatterometry, Critical dimension metrology, Reactive ion etching, Semiconducting wafers, Scatter measurement

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Wafer-level optics, Thin films, Ellipsometry, X-ray optics, Metrology, Diffractive optical elements, Optical properties, X-rays, Dielectrics, Optical testing, Process control, Deposition processes, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9782, Advanced Etch Technology for Nanopatterning V
KEYWORDS: Metrology, Optical lithography, Etching, Copper, Scatterometry, Optical metrology, Process control, Semiconducting wafers, Optics manufacturing, Chemical mechanical planarization

Showing 5 of 23 publications
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