Prof. Costas J. Spanos
at Univ of California Berkeley
SPIE Involvement:
Conference Program Committee | Author
Publications (60)

Proceedings Article | 16 March 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Statistical analysis, Data modeling, Monte Carlo methods, Transistors, Computer aided design, Structural design, Circuit switching, Statistical modeling, Performance modeling, Device simulation, Solid modeling

SPIE Journal Paper | 19 September 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Scatterometry, Finite element methods, Inspection, Metrology, Diffraction gratings, Scanning electron microscopy, Diffraction, Critical dimension metrology, Computing systems, Manufacturing

Proceedings Article | 2 April 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Metrology, Statistical analysis, Manufacturing, Inspection, Computer simulations, Scanning electron microscopy, Scatterometry, Finite element methods, Diffraction gratings

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Mathematical modeling, Metrology, Statistical analysis, Scanning electron microscopy, Scatterometry, Process control, Semiconductor manufacturing, Critical dimension metrology, Semiconducting wafers, Statistical modeling

Proceedings Article | 5 April 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Metrology, Statistical analysis, Data modeling, Error analysis, Manufacturing, Scanning electron microscopy, Time metrology, Plasma etching, Semiconductor manufacturing, Semiconducting wafers

Showing 5 of 60 publications
Conference Committee Involvement (9)
Metrology, Inspection, and Process Control for Microlithography XXIX
23 February 2015 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVIII
24 February 2014 | San Jose, California, United States
Metrology, Inspection, and Process Control for Microlithography XXVII
25 February 2013 | San Jose, California, United States
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III
28 August 2007 | San Diego, California, United States
Data Analysis and Modeling for Patterning Control III
23 February 2006 | San Jose, California, United States
Showing 5 of 9 Conference Committees
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