Dr. Craig D. Higgins
Research Scientist at KLA Texas
SPIE Involvement:
Author
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Publications (17)

Proceedings Article | 21 November 2023 Presentation + Paper
Eunju Kim, Wooseok Kim, Jonggwan Lee, Seongjong Kim, Sukyong Lee, Nohong Kwak, Mincheol Kang, Yongchul Jeong, Myungsoo Hwang, Chang-Min Park, Kyoil Koo, Seongtae Jeong, John Biafore, Mark Smith, Trey Graves, Anatoly Burov, Pradeep Vukkadala, Guy Parsey, Cao Zhang, Kunlun Bai, Janez Krek, Craig Higgins, Sergei Bakarian, Kyeongeun Ko, Roel Gronheid, Kaushik Sah, Andrew Cross, Yi Liu, Alessandro Vaglio Pret, Chris Walker, Vikram Tolani, George Hwa, Peter Hu, Chang Song, Alex Arkhipov, Loemba Bouckou, Chi-Ping Liu, Xiaochun Yang, Kana O'Hara, Donghwan Son
Proceedings Volume 12750, 127500C (2023) https://doi.org/10.1117/12.2687373
KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Computational lithography, Printing, Semiconducting wafers, Photoresist materials, Extreme ultraviolet lithography, Statistical analysis, Physical phenomena

Proceedings Article | 24 March 2017 Presentation + Paper
Proceedings Volume 10143, 101430E (2017) https://doi.org/10.1117/12.2258660
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Stochastic processes, Failure analysis, 193nm lithography, Photons, Logic, Modulation, Line width roughness, Photomasks, Cadmium, Statistical analysis, Image quality

Proceedings Article | 20 March 2015 Paper
Sohan Mehta, Lakshmi Ganta, Vikrant Chauhan, Yixu Wu, Sunil Singh, Chia Ann, Lokesh Subramany, Craig Higgins, Burcin Erenturk, Ravi Srivastava, Paramjit Singh, Hui Peng Koh, David Cho
Proceedings Volume 9425, 94250B (2015) https://doi.org/10.1117/12.2087546
KEYWORDS: Critical dimension metrology, Binary data, Double patterning technology, Etching, Photomasks, Photoresist processing, Nanoimprint lithography, Image processing, Optical lithography, Neodymium

Proceedings Article | 17 April 2014 Paper
Jerome Wandell, Anton deVilliers, Lior Huli, Serge Biesemans, Kathleen Nafus, Mike Carcasi, Jeff Smith, Dave Hetzer, Craig Higgins, Vinayak Rastogi, Erik Verduijn
Proceedings Volume 9048, 90483B (2014) https://doi.org/10.1117/12.2048862
KEYWORDS: Extreme ultraviolet, Etching, Double patterning technology, Extreme ultraviolet lithography, Atomic layer deposition, Line edge roughness, Line width roughness, Photoresist processing, Lithography, Resist chemistry

Proceedings Article | 17 April 2014 Paper
Craig Higgins, Erik Verduijn, Xiang Hu, Liang Wang, Mandeep Singh, Jerome Wandell, Sohan Mehta, Jean Raymond Fakhoury, Mark Zaleski, Yi Zou, Hui Peng Koh, Pawitter Mangat
Proceedings Volume 9048, 90481Q (2014) https://doi.org/10.1117/12.2048285
KEYWORDS: Photomasks, Extreme ultraviolet, Semiconducting wafers, Extreme ultraviolet lithography, Metals, Optical lithography, Optical proximity correction, Overlay metrology, Deep ultraviolet, Inspection

Showing 5 of 17 publications
Conference Committee Involvement (6)
Advances in Patterning Materials and Processes XL
27 February 2023 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXIX
25 April 2022 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVIII
22 February 2021 | Online Only, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Showing 5 of 6 Conference Committees
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