Dr. Craig D. Higgins
Research Scientist at KLA
SPIE Involvement:
Conference Program Committee | Author
Websites:
Publications (16)

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Logic, Statistical analysis, Cadmium, Modulation, Photons, Image quality, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Failure analysis, Stochastic processes, 193nm lithography

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Etching, Image processing, Photomasks, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Neodymium, Photoresist processing, Binary data

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Optical lithography, Deep ultraviolet, Metals, Inspection, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers, Overlay metrology

Proceedings Article | 17 April 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Etching, Atomic layer deposition, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Line edge roughness, Photoresist processing, Resist chemistry

Proceedings Article | 18 March 2014 Paper
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Data modeling, Calibration, 3D modeling, Data processing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Showing 5 of 16 publications
Conference Committee Involvement (4)
Advances in Patterning Materials and Processes XXXVIII
21 February 2021 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVII
24 February 2020 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXVI
25 February 2019 | San Jose, California, United States
Advances in Patterning Materials and Processes XXXV
27 February 2018 | San Jose, California, United States
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