Dr. Craig Rosslee
at Lam Research Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Image processing, Particles, Chromium, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Immersion lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Reticles, Optical lithography, Sensors, Scanning electron microscopy, Signal processing, Double patterning technology, Optical alignment, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Particles, Composites, Coating, Chemistry, Manufacturing, Control systems, Adsorption, Manufacturing equipment, Semiconducting wafers

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Optical lithography, Scanners, Double patterning technology, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers, Wafer manufacturing, Temperature metrology

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Metrology, Particles, Chemistry, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Immersion lithography, Intelligence systems, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Metrology, Polarization, Calibration, Etching, Scanners, Double patterning technology, Zone plates, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Showing 5 of 7 publications
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