Dr. Craig Rosslee
at Lam Research Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Particles, Extreme ultraviolet lithography, Image processing, Lithography, Immersion lithography, Photomasks, Extreme ultraviolet, Chromium

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Double patterning technology, Semiconducting wafers, Optical alignment, Scanning electron microscopy, Sensors, Reticles, Lithography, Signal processing, Optical lithography, Photoresist processing

PROCEEDINGS ARTICLE | March 30, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Manufacturing, Particles, Chemistry, Composites, Coating, Semiconducting wafers, Manufacturing equipment, Lithography, Adsorption, Control systems

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Semiconducting wafers, Double patterning technology, Thin film coatings, Optical lithography, Critical dimension metrology, Temperature metrology, Lithography, Scanners, Photoresist processing, Wafer manufacturing

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Chemistry, Semiconducting wafers, Inspection, Immersion lithography, Scanning electron microscopy, Manufacturing, Particles, Intelligence systems, Photomasks, Metrology

PROCEEDINGS ARTICLE | March 24, 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Etching, Semiconducting wafers, Double patterning technology, Calibration, Metrology, Photoresist processing, Scanners, Polarization, Zone plates, Critical dimension metrology

Showing 5 of 7 publications
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