Craig S. Thayer
Technical Writer at
SPIE Involvement:
Author | Instructor
Publications (1)

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Metals, Error analysis, Resistance, Capacitance, Photomasks, Double patterning technology, Overlay metrology, Device simulation, Resolution enhancement technologies

Course Instructor
SC670: Software-based Integrated Circuit Design Fundamentals
Over the last half century, integrated circuit (IC) design has taken root from the invention of the solid-state transistor to multi-million transistor circuits. Accommodating this remarkable evolution of circuit design is the electronic design automation (EDA) industry. From the driving forces of fierce industry competition to the self-imposed adherence to Moore's Law, the EDA industry has provided design and productivity solutions spanning a multitude of disciplines. From the invention of hardware definition languages (HDL), to the extension of the marketable life of semiconductor exposure systems, the EDA industry has continued to meet ever-increasing semiconductor industry challenges. This course provides an overview of integrated circuit design using software tools commonly available to the electronic design automation industry. Software tools, methods of design and their respective impact on integrated circuit design are discussed. The course covers a brief history of the EDA industry, with primary focus on traditional methods of implementation, verification and simulation of design content. The course discussions encompass a typical, holistic design flow prior to IC mask making and fabrication, and IC manufacturing problems and solutions addressed by the EDA industry.
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