Craig A. West
Sr. Member Technical Staff at Toppan Photomasks Inc
SPIE Involvement:
Publications (8)

Proceedings Article | 4 April 2011 Paper
Ashesh Parikh, Siew Dorris, Tom Smelko, Walter Walbrick, Pushpa Mahalingam, John Arch, Kent Green, Vishal Garg, Peter Buck, Craig West
Proceedings Volume 7974, 79740N (2011)
KEYWORDS: Photomasks, Reticles, Deep ultraviolet, Analog electronics, Silicon, Optical proximity correction, Critical dimension metrology, Lithography, Resolution enhancement technologies, CMOS technology

Proceedings Article | 25 May 2010 Paper
Proceedings Volume 7748, 774811 (2010)
KEYWORDS: Air contamination, Quartz, Photomasks, Inspection, Ions, Chemical analysis, Scanning electron microscopy, Nitrogen, Data modeling, Oxidation

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712234 (2008)
KEYWORDS: Reticles, Optical proximity correction, Photomasks, Resolution enhancement technologies, Semiconducting wafers, Lithography, Modulation, Logic, Calibration, Product engineering

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 712219 (2008)
KEYWORDS: Photomasks, Semiconducting wafers, Scanners, Inspection, Wafer inspection, Critical dimension metrology, Printing, Metrology, Manufacturing, Defect inspection

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 63490K (2006)
KEYWORDS: Pellicles, Optical proximity correction, Apodization, Polarization, Critical dimension metrology, Lithography, Photomasks, Semiconducting wafers, Reticles, Spatial frequencies

Showing 5 of 8 publications
Conference Committee Involvement (2)
Photomask Technology
18 September 2007 | Monterey, California, United States
Photomask Technology
19 September 2006 | Monterey, California, United States
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