Dr. Cristian Landoni
Analyzers Applications at SAES Pure Gas Inc
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | October 5, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Carbon dioxide, Particles, Gases, Photomasks, Integrated circuits, Analytical research, Medium wave, Semiconducting wafers, Mask cleaning, Liquids

PROCEEDINGS ARTICLE | April 10, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Semiconductors, Contamination, Argon, Scanners, Gases, Hydrogen, Nitrogen, Extreme ultraviolet, Palladium, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Carbon dioxide, Sensors, Scanners, Oxygen, Extreme ultraviolet lithography, Immersion lithography, Carbon monoxide, 193nm lithography, Nitrous oxide

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Environmental monitoring, Contamination, Iron, Statistical analysis, Ions, Mass spectrometry, Medium wave, Solid state physics, Solid state electronics, Chromatography

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Contamination, Statistical analysis, Gases, Sulfur, Solid state physics, Solid state electronics, Standards development, Liquids

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Optical lithography, Contamination, Statistical analysis, Deep ultraviolet, Calibration, Ions, Silicon, Gases, Semiconducting wafers

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top