Mr. Curt Allen Jackson
Engineering Director at Toppan Photomasks Inc
SPIE Involvement:
Conference Program Committee | Author
Publications (13)

PROCEEDINGS ARTICLE | November 5, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Deep ultraviolet, Metals, Printing, Photomasks, Artificial intelligence, Optical alignment, Bragg cells, Semiconducting wafers, Evolutionary algorithms

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Diffractive optical elements, Deep ultraviolet, Printing, Objectives, Photomasks, Image enhancement, Optical proximity correction, Bragg cells, Semiconducting wafers, Vestigial sideband modulation

PROCEEDINGS ARTICLE | December 6, 2004
Proc. SPIE. 5567, 24th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Mirrors, Reticles, Deep ultraviolet, Photomasks, Servomechanisms, Artificial intelligence, Semiconducting wafers, Signal detection, Vestigial sideband modulation

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Electron beam lithography, Lithographic illumination, Deep ultraviolet, Manufacturing, Solids, Photomasks, Semiconducting wafers, Tolerancing, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Printing, Photomasks, Image enhancement, Critical dimension metrology, Thin film coatings, Photoresist processing, Vestigial sideband modulation

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Electron beam lithography, Deep ultraviolet, Metals, Photomasks, Optical proximity correction, Error control coding, Semiconducting wafers, Binary data, Laser systems engineering

Showing 5 of 13 publications
Conference Committee Involvement (1)
Photomask and Next Generation Lithography Mask Technology XIV
17 April 2007 | Yokohama, Japan
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