Dr. Curtis Durfee
SPIE Involvement:
Publications (5)

Proceedings Article | 10 April 2024 Presentation + Paper
Houssam Chouaib, Valeria Dimastrodonato, Anderson Chou, Agostino Cangianoa, Andrew Cross, Derrick Shaughnessy, Zhengquan Tan, Daniel Schmidt, Curtis Durfee, Shanti Pancharatnam, Julien Frougier, Andrew Greene, Mary Breton
Proceedings Volume 12955, 129550L (2024) https://doi.org/10.1117/12.3010790
KEYWORDS: Semiconducting wafers, Education and training, Transmission electron microscopy, Nanosheets, Gallium arsenide, Data modeling, Ellipsometry, Metrology, Diffractive optical elements, Mathematical optimization

SPIE Journal Paper | 27 January 2022 Open Access
JM3, Vol. 21, Issue 02, 021203, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021203
KEYWORDS: Silicon, Germanium, Raman spectroscopy, Optical lithography, Manufacturing, Semiconducting wafers, Polarization, Metrology, Raman scattering, Phonons

Proceedings Article | 5 March 2021 Presentation + Paper
Proceedings Volume 11611, 116111U (2021) https://doi.org/10.1117/12.2582364
KEYWORDS: Interferometry, Silicon, Metrology, Scatterometry, Reflectometry, Transmission electron microscopy, Semiconductor manufacturing, Reflectivity, Polarization control

Proceedings Article | 25 February 2021 Presentation + Paper
Proceedings Volume 11611, 116111T (2021) https://doi.org/10.1117/12.2582181
KEYWORDS: Raman spectroscopy, Manufacturing, Metrology, Optical lithography, X-ray diffraction, Silicon, Nondestructive evaluation, Germanium, Diffraction, Transistors

Proceedings Article | 22 February 2021 Presentation
Proceedings Volume 11611, 116111R (2021) https://doi.org/10.1117/12.2583636
KEYWORDS: Metrology, Line edge roughness, Gallium arsenide, Transistors, Semiconductors, Nondestructive evaluation, Nanotechnology, Manufacturing, Machine learning, Logic

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