Dr. Curtis Durfee Profile

Dr. Curtis Durfee

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Publications (5)

Proceedings Article | 10 April 2024 Presentation + Paper

Novel ellipsometry metrology-based machine learning technique for low sensitivity characterization of critical dimensions within gate-all-around transistors

Houssam Chouaib, Valeria Dimastrodonato, Anderson Chou, Agostino Cangianoa, Andrew Cross, Derrick Shaughnessy, Zhengquan Tan, Daniel Schmidt, Curtis Durfee, Shanti Pancharatnam, Julien Frougier, Andrew Greene, Mary Breton

Proceedings Volume 12955, 129550L (2024) https://doi.org/10.1117/12.3010790

KEYWORDS: Semiconducting wafers, Education and training, Transmission electron microscopy, Nanosheets, Gallium arsenide, Data modeling, Ellipsometry, Metrology, Diffractive optical elements, Mathematical optimization

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SPIE Journal Paper | 27 January 2022 Open Access

In-line Raman spectroscopy for gate-all-around nanosheet device manufacturing

Daniel Schmidt, Curtis Durfee, Juntao Li, Nicolas Loubet, Aron Cepler, Lior Neeman, Noga Meir, Jacob Ofek, Yonatan Oren, Daniel Fishman

JM3, Vol. 21, Issue 02, 021203, (January 2022) https://doi.org/10.1117/12.10.1117/1.JMM.21.2.021203

KEYWORDS: Silicon, Germanium, Raman spectroscopy, Optical lithography, Manufacturing, Semiconducting wafers, Polarization, Metrology, Raman scattering, Phonons

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Proceedings Article | 5 March 2021 Presentation + Paper

OCD enhanced: implementation and validation of spectral interferometry for nanosheet inner spacer indentation

D. Schmidt, C. Durfee, S. Pancharatnam, M. Medikonda, A. Greene, J. Frougier, A. Cepler, G. Belkin, D. Shafir, R. Koret, R. Shtainman, I. Turovets, S. Wolfling

Proceedings Volume 11611, 116111U (2021) https://doi.org/10.1117/12.2582364

KEYWORDS: Interferometry, Silicon, Metrology, Scatterometry, Reflectometry, Transmission electron microscopy, Semiconductor manufacturing, Reflectivity, Polarization control

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Proceedings Article | 25 February 2021 Presentation + Paper

In-line Raman spectroscopy for stacked nanosheet device manufacturing

D. Schmidt, C. Durfee, J. Li, N. Loubet, A. Cepler, L. Neeman, N. Meir, J. Ofek, Y. Oren, D. Fishman

Proceedings Volume 11611, 116111T (2021) https://doi.org/10.1117/12.2582181

KEYWORDS: Raman spectroscopy, Manufacturing, Metrology, Optical lithography, X-ray diffraction, Silicon, Nondestructive evaluation, Germanium, Diffraction, Transistors

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Proceedings Article | 22 February 2021 Presentation

Nanosheet metrology opportunities for technology readiness

Mary Breton, Daniel Schmidt, Andrew Greene, Julien Frougier, Curtis Durfee, Indira Seshadri, Jennifer Church, Veeraraghavan Basker, Nelson Felix

Proceedings Volume 11611, 116111R (2021) https://doi.org/10.1117/12.2583636

KEYWORDS: Metrology, Line edge roughness, Gallium arsenide, Transistors, Semiconductors, Nondestructive evaluation, Nanotechnology, Manufacturing, Machine learning, Logic

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