Cynthia Zhu
Technical Marketing Engineer at Mentor, a Siemens Business
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Metals, Computer programming, Photomasks, Computational lithography, Optical proximity correction, Semiconducting wafers, Model-based design, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Lithography, Logic, Visualization, Scanners, Photomasks, Source mask optimization, SRAF, Semiconducting wafers, Back end of line, Fiber optic illuminators

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Logic, Calibration, Ions, Laser induced plasma spectroscopy, Photomasks, Source mask optimization, Optical proximity correction, Neodymium, Molybdenum, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Oxides, Data modeling, Calibration, Reflectivity, Photoresist materials, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Logic, Visualization, Metals, Manufacturing, Photomasks, Shape analysis, Double patterning technology, Optical proximity correction, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 14, 2006
Proc. SPIE. 6156, Design and Process Integration for Microelectronic Manufacturing IV
KEYWORDS: Lithography, Reticles, Metals, Design for manufacturing, Optical proximity correction, Optimization (mathematics), Semiconducting wafers, Model-based design, Process modeling, Resolution enhancement technologies

Showing 5 of 7 publications
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