Dr. Cyril Vannufel
at CEA-LETI
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 1 October 2013
Proc. SPIE. 8886, 29th European Mask and Lithography Conference
KEYWORDS: Mathematical modeling, Electron beam lithography, Point spread functions, Reticles, Metrology, Modulation, Calibration, Forward error correction, Semiconducting wafers, Chemical mechanical planarization

Proceedings Article | 23 September 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Electron beam lithography, Point spread functions, Metrology, Data modeling, Opacity, Calibration, Error analysis, Semiconducting wafers, Statistical modeling, Process modeling

Proceedings Article | 10 September 2011
Proc. SPIE. 8160, Polarization Science and Remote Sensing V
KEYWORDS: Optical imaging, Metrology, Error analysis, Polarimetry, Process control, Objectives, Microelectronics, Photomasks, Semiconducting wafers, Overlay metrology

SPIE Journal Paper | 1 July 2011
JM3 Vol. 10 Issue 03
KEYWORDS: Overlay metrology, Polarimetry, Error analysis, Silicon, Semiconducting wafers, Metrology, Optical testing, Microscopes, Critical dimension metrology, Mueller matrices

Proceedings Article | 20 April 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Microscopes, Metrology, Error analysis, Silicon, Manufacturing, Polarimetry, Optical testing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Showing 5 of 7 publications
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