Cyrus E. Tabery
Member of Technical Staff at ASML US Inc
SPIE Involvement:
Author
Publications (36)

Proceedings Article | 16 October 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Polishing, Metrology, Logic, Etching, Copper, Inspection, Extreme ultraviolet, Optical alignment, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Logic, Error analysis, Copper, Inspection, Scanning electron microscopy, Wafer inspection, Photomasks, Overlay metrology, Process modeling

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Lithography, Metrology, Optical parametric oscillators, Optical lithography, Principal component analysis, Scanners, Pattern recognition, Fingerprint recognition, Manufacturing, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 30 March 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Sensors, Databases, Manufacturing, Data processing, Design for manufacturing, Extreme ultraviolet, Optical proximity correction, Optical calibration, Model-based design, Process modeling, Standards development

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Photovoltaics, Data modeling, Photomasks, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design, Vestigial sideband modulation

Showing 5 of 36 publications
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