Da Bai Jiang
at GLOBALFOUNDRIES Singapore
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Reticles, Data modeling, Scanners, Scatterometry, Image quality, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Process modeling

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