Polycrystalline aluminum nitride films were deposited by reactive radio frequency magnetron sputtering on silicon and molybdenum substrates without substrate heating. Surface and microstructure properties were investigated by atomic force microscopy and x-ray diffraction. X-ray photoelectron spectroscopy was used to study the composition of the surface. Their optical properties were studied by spectroscopic ellipsometry in the 430-850 nm wavelength range and modeling was carried out. The optical properties so obtained were correlated with the AlN films' structure and crystalline quality.
Time-of-flight mass spectroscopy (TOF MS) spectra of ions ablated from BN-ceramic, amorphous carbon, graphite and fullerene-60 targets were recorded at different experimental conditions. It was found that the TOF MS spectra significantly simplify as the energy density of the laser radiation was increased, and show temporal evolution as the distance between the target surface and work area of TOF MS is increased. Moreover, the spectral line widths significantly increase with increasing laser radiation density and distance between target surface and work area of TOF MS. Analyses of these data allowed to estimate the average velocity of the ablated beam center of mass as well as the average energy of ions in the ablated plasma. Assignment of the spectral lines was also done. The data obtained can be used to optimize the synthesis nanostructured B-N and B-C-N materials by laser ablation.