Dae-Jin Park
at SK Hynix Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Lithography, Optical lithography, Optical proximity correction, SRAF

Proceedings Article | 16 March 2016 Paper
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Image compression, Atrial fibrillation, Ultraviolet radiation, Photomasks, Source mask optimization, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 14 December 2009 Paper
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, Image processing, Scanners, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 4 December 2008 Paper
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Metrology, Data modeling, Databases, Etching, Error analysis, Thermal effects, Transistors, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 21 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Optical lithography, Data modeling, Calibration, Image processing, Manufacturing, Scanning electron microscopy, Bridges, Optical proximity correction, Semiconducting wafers, Model-based design

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