Dae-Kwon Kang
Principal Engineer at ASML
SPIE Involvement:
Area of Expertise:
Multi-patterning (Coloring and etc.) , OPC , Data prep automation , Lithography process , Computer programming
Publications (4)

Proceedings Article | 22 February 2021 Poster + Paper
Proceedings Volume 11613, 116130Y (2021) https://doi.org/10.1117/12.2584692
KEYWORDS: Calibration, Machine learning, Signal processing, Physics, Optical proximity correction, Metrology, Lithography, Computational lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Young-Seok Kim, SeIl Lee, Zhenyu Hou, Yiqiong Zhao, Meng Liu, Yunan Zheng, Qian Zhao, Daekwon Kang, Lei Wang, Mark Simmons, Mu Feng, Jun Lang, Byoung-Il Choi, Gilbert Kim, Hakyong Sim, Jongcheon Park, Gyun Yoo, JeonKyu Lee, Sung-woo Ko, Jaeseung Choi, Cheolkyun Kim, Chanha Park
Proceedings Volume 10959, 1095913 (2019) https://doi.org/10.1117/12.2515274
KEYWORDS: Calibration, Metrology, Optical proximity correction, Data modeling, Instrument modeling, Scanning electron microscopy, Time metrology, Neural networks, Semiconducting wafers

Proceedings Article | 28 March 2017 Paper
Jookyoung Song, Jaeseung Choi, Chanha Park, Hyunjo Yang, Daekwon Kang, Minsu Oh, Manjae Park, James Moon, Jun Ye, Stanislas Baron
Proceedings Volume 10148, 1014813 (2017) https://doi.org/10.1117/12.2257872
KEYWORDS: Optical proximity correction, Photomasks, Manufacturing, Atrial fibrillation, Optical lithography, Model-based design, Lithography, Defect detection, Source mask optimization, Semiconducting wafers

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73791N (2009) https://doi.org/10.1117/12.824300
KEYWORDS: Double patterning technology, Optical proximity correction, Silicon, Optical lithography, Photomasks, Logic, Etching, Manufacturing, Metals, Lithography

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