Dae-Kwon Kang
at ASML Korea Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 11 May 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Lithography, Logic, Optical lithography, Etching, Metals, Silicon, Manufacturing, Photomasks, Double patterning technology, Optical proximity correction

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