DaeHo Hwang
at SKhynix
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 8 October 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Metrology, Laser therapeutics, Air contamination, Laser processing, Inspection, Chromium, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Particles, Manufacturing, Reliability, Inspection, Chromium, Photomasks, Critical dimension metrology, Optics manufacturing

Proceedings Article | 8 June 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Defect detection, Inspection, Image resolution, Photomasks, Artificial intelligence, SRAF, Critical dimension metrology, Signal detection, Optics manufacturing, Airborne remote sensing

Proceedings Article | 25 October 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Wafer-level optics, Inspection, Reflectivity, Pellicles, Photomasks, Critical dimension metrology, Semiconducting wafers, Resolution enhancement technologies, Light, Defect inspection

Proceedings Article | 15 May 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Reticles, Manufacturing, Inspection, Scanning electron microscopy, Printing, Photomasks, Critical dimension metrology, Semiconducting wafers, Tolerancing

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Defect detection, Calibration, Etching, Inspection, Reflectivity, Chromium, Photomasks, Critical dimension metrology, Algorithm development, Antimony

Showing 5 of 6 publications
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