Daekwon Kang
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Calibration, Scanning electron microscopy, Time metrology, Neural networks, Optical proximity correction, Semiconducting wafers, Instrument modeling

Proceedings Article | 28 March 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Defect detection, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers, Model-based design

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