Daeyoup Lee
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Near infrared, Lithography, Optical lithography, Etching, Resistance, Optical alignment, Semiconducting wafers, System on a chip, Overlay metrology

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Thin films, Lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Nanoimprint lithography, Semiconducting wafers, Model-based design

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Optical lithography, Deep ultraviolet, Reflection, Etching, Copper, Resistance, Photoresist materials, Critical dimension metrology, Photoresist processing, Absorption

Proceedings Article | 22 August 2001
Proc. SPIE. 4344, Metrology, Inspection, and Process Control for Microlithography XV
KEYWORDS: Microfluidics, Glasses, Image processing, Chromium, Control systems, Photomasks, Radiofrequency ablation, Critical dimension metrology, Photoresist processing, Phase shifts

Proceedings Article | 24 July 1996
Proc. SPIE. 2793, Photomask and X-Ray Mask Technology III
KEYWORDS: Wafer-level optics, Lithography, Optical lithography, Lithographic illumination, Deep ultraviolet, Printing, Photomasks, Halftones, Semiconducting wafers, Phase shifts

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