Dah-Chung Owe-Yang
Sr. Photolithography Engineer at Shin-Etsu MicroSi Inc
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 20 March 2012 Paper
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Near infrared, Optical sensors, Sensors, Polymers, Metals, Coating, Reflectivity, Semiconducting wafers, Back end of line, Absorption

Proceedings Article | 4 April 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Antireflective coatings, Etching, Silicon, Coating, Manufacturing, Resistance, Reflectivity, Immersion lithography, Photoresist processing

Proceedings Article | 26 March 2008 Paper
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Polymers, Interfaces, Silicon, Reflectivity, Photoresist materials, Semiconducting wafers

SPIE Journal Paper | 1 April 2006
JM3 Vol. 5 Issue 02

Proceedings Article | 4 May 2005 Paper
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Optical lithography, Polymers, Image processing, Ultraviolet radiation, Image resolution, Printing, Photomasks, Critical dimension metrology, Photoresist processing

Showing 5 of 7 publications
Conference Committee Involvement (9)
Advances in Patterning Materials and Processes XXXI
24 February 2014 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXX
25 February 2013 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXIX
13 February 2012 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVIII
28 February 2011 | San Jose, California, United States
Advances in Resist Materials and Processing Technology XXVI
23 February 2009 | San Jose, California, United States
Showing 5 of 9 Conference Committees
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