CONFERENCE PROCEEDINGS
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Dai Oguro
at Mitsubishi Gas Chemical Co Inc
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Author
Publications (1)
PROCEEDINGS ARTICLE | April 1, 2009
Development of new phenylcalix[4]resorcinarene: its application to positive-tone molecular resist for EB and EUV lithography
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Optical lithography, Etching, Polymers, Silicon, Cadmium sulfide, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Standards development, Industrial chemicals
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