Dai Tsunoda
Manager at Nippon Control System Corp
SPIE Involvement:
Publications (10)

Proceedings Article | 13 October 2020 Poster + Paper
Adam Lyons, Tom Wallow, Christoph Hennerkes, Chris Spence, Maxence Delorme, David Rio, Dai Tsunoda, Yohei Torigoe, Masakazu Hamaji
Proceedings Volume 11517, 115171D (2020) https://doi.org/10.1117/12.2573160
KEYWORDS: Photomasks, Optical proximity correction, Data modeling, Process modeling, Extreme ultraviolet, Semiconducting wafers, Metrology, Calibration, Finite element methods

Proceedings Article | 20 September 2020 Presentation
Dai Tsunoda, Yasuaki Horima, Yohei Torigoe, Brian Dillon, Adam Lyons, Tom Wallow, Kurt Wampler, Vincent Shu, Quan Zhang
Proceedings Volume 11518, 115180P (2020) https://doi.org/10.1117/12.2573132
KEYWORDS: Photomasks, Optical proximity correction, Lithography, Device simulation, Semiconducting wafers, Optical simulations

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10810, 108101H (2018) https://doi.org/10.1117/12.2502068
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Calibration, Extreme ultraviolet lithography, Critical dimension metrology, Mask making

Proceedings Article | 4 October 2016 Paper
Proceedings Volume 9985, 99851A (2016) https://doi.org/10.1117/12.2242972
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

Proceedings Article | 23 October 2015 Paper
Nobuyasu Takahashi, So Goto, Dai Tsunoda, So-Eun Shin, Sukho Lee, Jungwook Shon, Jisoong Park
Proceedings Volume 9635, 96351G (2015) https://doi.org/10.1117/12.2196713
KEYWORDS: Photomasks, Process modeling, Calibration, Error analysis, Computer simulations, Etching, Statistical modeling, Scanning electron microscopy, Photoresist processing, Cadmium

Showing 5 of 10 publications
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