Dai Tsunoda
Research and Development Engineer at Nippon Control System Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Calibration, Etching, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Mask making, Critical dimension metrology

Proceedings Article | 4 October 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Photovoltaics, Modulation, Metals, Control systems, Photomasks, Beam shaping, Source mask optimization, Optical proximity correction, SRAF, Semiconducting wafers

Proceedings Article | 23 October 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Cadmium, Calibration, Etching, Error analysis, Computer simulations, Scanning electron microscopy, Photomasks, Photoresist processing, Statistical modeling, Process modeling

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Modulation, Scattering, Chemical species, Molecules, Laser scattering, Parallel processing, Photomasks, Convolution, Critical dimension metrology

Proceedings Article | 2 April 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Electron beam lithography, Electron beams, Scattering, Calibration, Hydrogen, Laser scattering, Analytical research, Critical dimension metrology, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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