Mr. Daifeng Guo
at Univ of Illinois
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Electron beam lithography, Mirrors, Optical lithography, Polymers, Manufacturing, Directed self assembly, Extreme ultraviolet lithography, Semiconducting wafers, Algorithms

PROCEEDINGS ARTICLE | October 23, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Computer simulations, Photomasks, Optical simulations, Double patterning technology, Optimization (mathematics), Model-based design, Algorithms

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