Dr. Daiju Shiono
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Polymers, Coating, Surface roughness, Atomic force microscopy, Scanning electron microscopy, Surface properties, Directed self assembly, Chemical analysis, Phase measurement, Thin film coatings

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Light sources, Spectroscopy, Molecules, Coating, Surface roughness, Atomic force microscopy, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Line edge roughness

PROCEEDINGS ARTICLE | April 12, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Silicon, Inspection, Scanning electron microscopy, Silicon films, Extreme ultraviolet, Extreme ultraviolet lithography, Analytical research, Line edge roughness

PROCEEDINGS ARTICLE | March 22, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Polymers, Molecules, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Molybdenum, Chromatography

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, FT-IR spectroscopy, Etching, Argon, Glasses, Silicon, Silicon films, Absorbance, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Potassium, FT-IR spectroscopy, Etching, Polymers, Silicon, Inspection, Scanning electron microscopy, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 8 publications
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