Daisuke Maruyama
at Nissan Chemical Corp
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Etching, Polymers, Ultraviolet radiation, Diffusion, Amplifiers, Double patterning technology, Chemical reactions, Thin film coatings, Photoresist processing, Industrial chemicals

Proceedings Article | 12 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Polymers, Reflectivity, Scanning electron microscopy, Chromophores, Double patterning technology, Immersion lithography, Critical dimension metrology, Thin film coatings, Photoresist processing

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Ultraviolet radiation, Interfaces, Silicon, Resistance, Chemical vapor deposition, Double patterning technology, Thin film coatings, Semiconducting wafers, 193nm lithography

Proceedings Article | 4 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Etching, Polymers, Ultraviolet radiation, Reflectivity, Photomasks, Immersion lithography, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings, Absorption

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Sensors, Etching, Polymers, Silicon, Reflectivity, Control systems, Photoresist materials, Polymerization, Semiconducting wafers

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