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Daisuke Shimizu
at JSR Engineering Co Ltd
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Publications (1)
Proceedings Article | 29 March 2006 Paper
Performance comparison of chemically amplified resists under EUV, EB, and KrF exposure
Daisuke Shimizu, Nobuji Matsumura, Toshiyuki Kai, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Koichi Fujiwara
Proceedings Volume 6153, 615344 (2006) https://doi.org/10.1117/12.656097
KEYWORDS: Extreme ultraviolet lithography, Line width roughness, Chemically amplified resists, Photoresist materials, Extreme ultraviolet, Lithography, Ionization, Silver, Electron beam lithography, Electron beams
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