Dr. Damien Perret
Research and Development Engineer at Rohm and Haas Electronic Materials SAS
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 15 May 2010
Proc. SPIE. 7545, 26th European Mask and Lithography Conference
KEYWORDS: Semiconducting wafers, Polymers, Diffusion, Ionization, Sensors, Molecules, Statistical analysis, Chromatography, Spectroscopy, Lithography

Proceedings Article | 26 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Diffusion, Lithography, Temperature metrology, Chemically amplified resists, Photoresist processing, Glasses, Line edge roughness, Systems modeling, Thermal analysis, Complex systems

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Semiconducting wafers, Coating, Silicon, Photoresist materials, Lithography, Scanning electron microscopy, Etching, Optical lithography, Reflectivity, Natural surfaces

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Plasma treatment, Etching, Argon, Resistance, Photoresist materials, Plasma, Polymers, FT-IR spectroscopy, Photoresist processing, Ellipsometry

Proceedings Article | 22 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Etching, Polymers, Photoresist materials, Resistance, Chemical species, Lithography, Error analysis, Photoresist developing, Data modeling, Statistical modeling

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top