Damon M. Cole
Director of Technical Marketing
SPIE Involvement:
Author
Publications (15)

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Signal to noise ratio, Lithography, Electron beam lithography, Electrons, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Photomask technology, Vestigial sideband modulation

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Data modeling, Manufacturing, Photomasks, Beam shaping, Optical proximity correction, Manufacturing equipment, Model-based design, Vestigial sideband modulation

Proceedings Article | 5 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Electron beam lithography, Deep ultraviolet, Calibration, Spatial light modulators, Critical dimension metrology, Data conversion, Neodymium, Photoresist processing, Binary data, Overlay metrology

Proceedings Article | 28 June 2005 Paper
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Optical proximity correction, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy

Showing 5 of 15 publications
Conference Committee Involvement (1)
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
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