Mr. Damon M. Cole Profile

Damon M. Cole

Director of Technical Marketing

SPIE Involvement:

Conference Program Committee | Author

Publications (15)

Proceedings Article | 8 November 2012

Future mask writers requirements for the sub-10nm node era

Mahesh Chandramouli, Frank Abboud, Nathan Wilcox, Andrew Sowers, Damon Cole

Proc. SPIE. 8522, Photomask Technology 2012

KEYWORDS: Signal to noise ratio, Lithography, Electron beam lithography, Electrons, Photomasks, Beam shaping, Optical proximity correction, Raster graphics, Photomask technology, Vestigial sideband modulation

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Proceedings Article | 20 October 2006

Variable shaped beam writing throughput at the 45nm node and beyond

A. Sowers, M. Shumway, M. Kamna, N. Wilcox, M. Vernon, D. Cole, M. Chandramouli

Proc. SPIE. 6349, Photomask Technology 2006

KEYWORDS: Optical lithography, Data modeling, Manufacturing, Photomasks, Beam shaping, Optical proximity correction, Manufacturing equipment, Model-based design, Vestigial sideband modulation

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Proceedings Article | 5 November 2005

Production performance of a Sigma7300 DUV mask writer

Bob Olshausen, Mahesh Chandramouli, Dustin Wall, Bruce Auches, Damon Cole

Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology

KEYWORDS: Electron beam lithography, Deep ultraviolet, Calibration, Spatial light modulators, Critical dimension metrology, Data conversion, Neodymium, Photoresist processing, Binary data, Overlay metrology

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Proceedings Article | 28 June 2005

Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Mahesh Chandramouli, Bob Olshausen, Yulia Korobko, Sven Henrichs, Ping Qu, Jian Ma, Bruce Auches, Damon Cole, Thomas Ostrom, Angela Beyerl, Robert Eklund, Raoul Zerne, Peter Goransson, Magnus Persson, Tom Newman

Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII

KEYWORDS: Electron beam lithography, Optical lithography, Deep ultraviolet, Quartz, Chromium, Spatial light modulators, Photomasks, Optical alignment, Critical dimension metrology, Neodymium

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Proceedings Article | 20 August 2004

Comparative study of two negative CAR resists: EN-024M and NEB 31

Ki-Ho Baik, Robert Dean, Homer Lem, Stephen Osborne, Mark Mueller, Damon Cole

Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI

KEYWORDS: Lithography, Etching, Coating, Scanning electron microscopy, Photomasks, Optical proximity correction, Raster graphics, Critical dimension metrology, Line edge roughness, Photomicroscopy

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Proceedings Article | 1 August 2002

Raster scan patterning solution for 100- and 70-nm OPC masks

Frank Abboud, Ki-Ho Baik, Varoujan Chakarian, Damon Cole, Robert Dean, Mark Gesley, Herb Gillman, William Moore, Mark Mueller, Robert Naber, Thomas Newman, Romin Puri, Frederick Raymond, Mario Rougieri

Proc. SPIE. 4754, Photomask and Next-Generation Lithography Mask Technology IX

KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Etching, Control systems, Photomasks, Optical proximity correction, Raster graphics, Edge roughness

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Proceedings Article | 11 March 2002

100-nm OPC mask patterning using raster-scan 50-kV pattern generation technology

Frank Abboud, Ki-Ho Baik, Varoujan Chakarian, Damon Cole, Jay Daniel, Robert Dean, Mark Gesley, Robert Naber, Thomas Newman, Frederick Raymond, David Trost, Mark Wiltse, William DeVore

Proc. SPIE. 4562, 21st Annual BACUS Symposium on Photomask Technology

KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Optical lithography, Photomasks, Optical proximity correction, Raster graphics, Photoresist processing, Model-based design, Edge roughness

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Proceedings Article | 9 April 2001

130-nm node mask development

Jan Chabala, Suzanne Weaver, David Alexander, Maiying Lu, Nam-Wook Kim, Damon Cole

Proc. SPIE. 4349, 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents

KEYWORDS: Lithography, Statistical analysis, Etching, Dry etching, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photomicroscopy, Photoresist processing, Edge roughness

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Proceedings Article | 21 July 2000

Evaluation of a high-dose extended multipass gray writing system for 130-nm pattern generation

Jan Chabala, Suzanne Weaver, David Alexander, Henry Pearce-Percy, Maiying Lu, Damon Cole, Frank Abboud

Proc. SPIE. 3997, Emerging Lithographic Technologies IV

KEYWORDS: Lithography, Etching, Composites, Control systems, Atomic force microscopy, Printing, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness

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Proceedings Article | 3 February 2000

Lithography and CD performance of advanced MEBES mask pattern generators

Jan Chabala, Damon Cole, Henry Pearce-Percy, Wayne Phillips, Maiying Lu, Suzanne Weaver, David Alexander, T. Coleman, Charles Sauer, Frank Abboud

Proc. SPIE. 3996, 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents

KEYWORDS: Lithography, Metrology, Etching, Dry etching, Error analysis, Printing, Photomasks, Critical dimension metrology, Photoresist processing, Charged particle optics

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Proceedings Article | 30 December 1999

Extension of graybeam writing for the 130-nm technology node

Jan Chabala, Frank Abboud, Charles Sauer, Suzanne Weaver, Maiying Lu, Henry Pearce-Percy, Ulrich Hofmann, Matthew Vernon, Dinh Ton, Damon Cole, Robert Naber

Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology

KEYWORDS: Lithography, Metrology, Scattering, Etching, Dry etching, Error analysis, Printing, Photomasks, Critical dimension metrology, Charged particle optics

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Proceedings Article | 30 December 1999

Reduction of beam-induced pattern placement errors in MEBES systems

David Alexander, Lee Veneklasen, Suzanne Weaver, Jeffrey Varner, Damon Cole

Proc. SPIE. 3873, 19th Annual Symposium on Photomask Technology

KEYWORDS: Electron beams, Data modeling, Backscatter, Error analysis, Dielectrics, Chromium, Process control, Chlorine, Photoresist processing, Dielectric breakdown

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Proceedings Article | 25 June 1999

Lithographic analysis of multipass gray writing strategy for electron-beam pattern generation

Jan Chabala, Frank Abboud, Robert Dean, Suzanne Weaver, Damon Cole, Charles Sauer, Frederick Raymond, Ulrich Hofmann

Proc. SPIE. 3676, Emerging Lithographic Technologies III

KEYWORDS: Lithography, Scattering, Etching, Dry etching, Printing, Monte Carlo methods, Photomasks, Computer aided design, Critical dimension metrology, Line edge roughness

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Proceedings Article | 18 December 1998

New MEBES pattern generator

Jan Chabala, Frank Abboud, Suzanne Weaver, Damon Cole

Proc. SPIE. 3546, 18th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Monochromatic aberrations, Reticles, Metrology, Etching, Dry etching, Composites, Printing, Photomasks, Critical dimension metrology, Photoresist processing

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Proceedings Article | 12 February 1997

Advanced electron-beam pattern generation technology for 180-nm masks

Frank Abboud, Charles Sauer, William Wang, Matthew Vernon, Richard Prior, Henry Pearce-Percy, Damon Cole, Marian Mankos

Proc. SPIE. 3236, 17th Annual BACUS Symposium on Photomask Technology and Management

KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Etching, Dry etching, Photomasks, Optical proximity correction, Raster graphics, Semiconducting wafers, Binary data

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Showing 5 of 15 publications

Conference Committee Involvement (1)

Emerging Patterning Technologies 2017

27 February 2017 | San Jose, California, United States

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