Daniel T. Elg
at Univ of Illinois
SPIE Involvement:
Author
Publications (10)

SPIE Journal Paper | 7 April 2017
JM3 Vol. 16 Issue 02
KEYWORDS: Tin, Plasma, Ions, Hydrogen, Etching, Extreme ultraviolet, In situ metrology, Extreme ultraviolet lithography, Data modeling, Reflection

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Oxidation, Tin, Hydrogen, Extreme ultraviolet, Etching, Plasma, Probability theory, EUV optics, Chemical species, Reflectivity, Mirrors, Ions, Neodymium, Extreme ultraviolet lithography

SPIE Journal Paper | 5 February 2016
JM3 Vol. 15 Issue 01
KEYWORDS: Chemical species, Tin, Argon, Scattering, Extreme ultraviolet, Plasma, Autoregressive models, Ions, Calibration, Microchannel plates

Proceedings Article | 6 April 2015 Paper
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Plasma, Tin, Extreme ultraviolet, Reflectivity, Etching, Hydrogen, Ions, Plasma etching, Extreme ultraviolet lithography, Process modeling

SPIE Journal Paper | 9 February 2015
JM3 Vol. 14 Issue 01
KEYWORDS: Ions, Extreme ultraviolet, Magnetism, Plasma, Extreme ultraviolet lithography, Argon, Electrons, Metrology, Computer simulations, Lithography

Showing 5 of 10 publications
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