Ion barrier film (IBF) on the input side surface of Micro-channel Plate (MCP ) has a dual role in the high electron transmittance and high ionic blocking rate, and the quality of the film is very strict, so to choose a good coating way to meet the application of IBF-MCP in the third image intensifier is very important. Ion beam sputtering deposition (IBSD) technology is a relatively mature coating technology which can obtain a dense strong adhesion and smooth, high-quality film. This paper is carried out from the quality analysis on surface morphology, crystal structure and coating quality and comparison with qualified film to determine a better way to prepare IBF on the input side surface of MCP.
The noise factor, which is the main factor affecting the noise performance of image intensifier and can accurately reflect the noise characteristics of the micro-channel plate(MCP), is the ratio of the input signal to noise ratio (SNR) and the output SNR. According to definition of noise factor of micro channel plate, noise mechanism and test principle, noise factor of filmed MCP test system is established in order to study the technical way to reduce noise factor of MCP. Because the input surface of the MCP is covered with ion barrier film to block the feedback ions, which have a great impact on the noise factor of the MCP. Hence, noise factor of filmed MCP and un-filmed MCP is measured respectively, and noise factors with different materials and different filmed thickness are measured too. Relationships between noise factor and filmed thickness, noise factor and output SNR of image intensifier have been obtained. That is valuable to reduce the noise of filmed MCP.
Rb+, Cs+ and other alkali metal ions in the Micro-channel Plate（MCP）channel, under the action of an electric field, leave out of the channel wall of MCP, and accelerate to input surface of channel along the opposite direction of the electric field to form ion feedback-induced noise. The feedback ions will cause great harms, it will bombard the cathode surface, resulting in decreased cathode sensitivity, reducing tube life, so you must take measures to reduce ion feedback-induced noise. This paper analyzes how to reduce ion feedback-induced noise from five aspects of the MCP materials, etching, annealing in hydrogen, high-temperature baking and electron scrubbing. Through the utilization of mixed alkali effect of suppressing mutual diffusion and decreasing internal network cavity to improve structure of MCP glass wall, the diffusion coefficient of each ion is reduced; the content of Al2O3 is reduced to reduce the Na+, K+ diffusion losses; etching process is optimized, except for the acid corrosion, the alkali corrosion, special acid etching and vacuum baking process are used; annealing in hydrogen technology is also optimized, the time of annealing in hydrogen was chosen on 270 ~ 350 minutes; and the vacuum baking and electron scrubbing are handled before manufacturing. By the above methods the ion feedback-induced noise is reduced.