Dr. Dan Meisburger
at Tec-Start Consulting
SPIE Involvement:
Editorial Board Member: Journal of Micro/Nanolithography, MEMS, and MOEMS | Author
Publications (4)

Proceedings Article | 16 September 2014
Proc. SPIE. 9236, Scanning Microscopies 2014
KEYWORDS: Wafer-level optics, Electron beams, Lenses, Silicon, Manufacturing, Monte Carlo methods, Objectives, Tolerancing, Optics manufacturing, Charged particle optics

Proceedings Article | 11 February 2011
Proc. SPIE. 7932, Emerging Digital Micromirror Device Based Systems and Applications III
KEYWORDS: Lithography, Mirrors, Image resolution, Control systems, Distortion, Printing, Photomasks, Digital micromirror devices, Digital electronics, Binary data

Proceedings Article | 15 November 1999
Proc. SPIE. 3777, Charged Particle Optics IV
KEYWORDS: Lithography, Electron beam lithography, Monochromatic aberrations, Argon, Magnetism, Monte Carlo methods, Projection systems, Stochastic processes, Charged-particle lithography, Polonium

Proceedings Article | 22 May 1995
Proc. SPIE. 2439, Integrated Circuit Metrology, Inspection, and Process Control IX
KEYWORDS: Wafer-level optics, Defect detection, Imaging systems, Metals, Inspection, Computing systems, Scanning electron microscopy, Optical inspection, Wafer inspection, Semiconducting wafers

Conference Committee Involvement (1)
Charged Particle Beam Optics Imaging
30 July 2001 | San Diego, CA, United States
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