Mr. Dan L. White
Product Marketing Manager at Synopsys Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Data modeling, Error analysis, Computer simulations, Printing, Photomasks, Optical proximity correction, Semiconducting wafers, Model-based design, Process modeling

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Lithography, Light sources, Manufacturing, Design for manufacturing, Transistors, Field effect transistors, Optical proximity correction, Critical dimension metrology, Process modeling, Device simulation

PROCEEDINGS ARTICLE | May 5, 2005
Proc. SPIE. 5756, Design and Process Integration for Microelectronic Manufacturing III
KEYWORDS: Human-machine interfaces, Databases, Manufacturing, Distortion, Design for manufacturing, Photomasks, Data conversion, Semiconducting wafers, Electronic design automation, Design for manufacturability

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