Mr. Dan N. Zhang Profile

Dan N. Zhang

R&D Engineer at Synopsys Inc

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Publications (6)

Proceedings Article | 20 October 2006 Paper

Model-based lithography verification using the new manufacturing sensitivity model

Daniel Zhang, Lawrence Melvin

Proceedings Volume 6349, 63494Q (2006) https://doi.org/10.1117/12.686711

KEYWORDS: Manufacturing, Lithography, Resolution enhancement technologies, Image processing, Photomasks, Critical dimension metrology, Process modeling, Optical proximity correction, Semiconducting wafers, Model-based design

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Proceedings Article | 14 March 2006 Paper

The use of process models to enhance device performance through semiconductor design

Lawrence Melvin, Daniel Zhang

Proceedings Volume 6156, 61560J (2006) https://doi.org/10.1117/12.656964

KEYWORDS: Process modeling, Manufacturing, Statistical modeling, Model-based design, Image processing, Semiconducting wafers, Semiconductors, Nanoimprint lithography, Statistical analysis, Error analysis

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Proceedings Article | 8 November 2005 Paper

Full-chip level MEEF analysis using model based lithography verification

Juhwan Kim, Lantian Wang, Daniel Zhang, Zongwu Tang

Proceedings Volume 5992, 59922U (2005) https://doi.org/10.1117/12.632019

KEYWORDS: Photomasks, Critical dimension metrology, Lithography, Optical lithography, Semiconducting wafers, Bridges, Data modeling, Optical proximity correction, Process modeling, Error analysis

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Proceedings Article | 5 November 2005 Paper

Full-chip poly gate critical dimension control using model based lithography verification

Daniel Zhang, Juhwan Kim, Lantian Wang, Zongwu Tang

Proceedings Volume 5992, 59925E (2005) https://doi.org/10.1117/12.632302

KEYWORDS: Critical dimension metrology, Photomasks, Optical proximity correction, Lithography, Error analysis, Semiconducting wafers, Data modeling, Control systems, Model-based design, Tolerancing

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Proceedings Article | 28 June 2005 Paper

Contact CD variation check and contact/metal overlay check using a model based full chip verification software tool

Lantian Wang, Juhwan Kim, Daniel Zhang, Zongwu Tang, Minghui Fan

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617139

KEYWORDS: Critical dimension metrology, Optical proximity correction, Overlay metrology, Error analysis, Metals, Photomasks, Semiconducting wafers, Tolerancing, Data modeling, Resolution enhancement technologies

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Proceedings Article | 28 June 2005 Paper

Model-based full-chip verification for 65nm lithography process development

Juhwan Kim, Lantian Wang, Daniel Zhang, Zongwu Tang

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617141

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Optical proximity correction, Resolution enhancement technologies, Data modeling, Optical lithography, Metals, Model-based design, Systems modeling

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Showing 5 of 6 publications

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