Dr. Daniel S. Abrams
CTO at Luminescent Technologies
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Lithography, Diffraction, Manufacturing, Inverse problems, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 15, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Diffraction, Inverse problems, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Model-based design, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Semiconductors, Lithography, Manufacturing, Computer simulations, Photomasks, SRAF, Chemical elements, Tolerancing, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | May 20, 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Deep ultraviolet, Manufacturing, Inspection, Photomasks, Optical proximity correction, Mask making, Semiconducting wafers, Vestigial sideband modulation, Inverse optics

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Diffraction, Manufacturing, Inverse problems, Photomasks, Optical proximity correction, SRAF, Semiconducting wafers, Binary data, Inverse optics

PROCEEDINGS ARTICLE | November 8, 2005
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Semiconductors, Lithography, Image segmentation, Manufacturing, Printing, Image quality, Photomasks, Optical proximity correction, Inverse optics, Resolution enhancement technologies

Showing 5 of 8 publications
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