Dr. Daniel S. Abrams
CEO
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Lithography, Optical proximity correction, Diffraction, Inverse problems, Phase shifts, Resolution enhancement technologies, Manufacturing

Proceedings Article | 15 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Photomasks, SRAF, Semiconducting wafers, Optical proximity correction, Lithography, Inverse problems, Phase shifts, Diffraction, Model-based design, Resolution enhancement technologies

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Photomasks, SRAF, Lithography, Semiconductors, Manufacturing, Computer simulations, Phase shifts, Tolerancing, Resolution enhancement technologies, Chemical elements

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Lithography, Manufacturing, Inspection, Vestigial sideband modulation, Mask making, Deep ultraviolet, Inverse optics

Proceedings Article | 15 March 2006 Paper
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Manufacturing, Binary data, Inverse problems, SRAF, Optical proximity correction, Inverse optics, Diffraction

Showing 5 of 8 publications
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