Prof. Daniel E. Adams
at JILA
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Microscopes, Diffraction, Mirrors, Detection and tracking algorithms, Sensors, Image resolution, Image transmission, Extreme ultraviolet, Reconstruction algorithms, Spatial resolution

PROCEEDINGS ARTICLE | September 30, 2016
Proc. SPIE. 9948, Novel Optical Systems Design and Optimization XIX
KEYWORDS: Microscopes, Diffraction, Coherence imaging, Imaging systems, Sensors, X-rays, Image resolution, Data acquisition, Extreme ultraviolet, X-ray imaging

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Coherence imaging, Metrology, Polarization, Spatial filters, Spectroscopy, Wave propagation, Deconvolution, Reconstruction algorithms, Laser beam diagnostics, Diffraction gratings

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Coherence imaging, Mirrors, Spectroscopy, Microscopy, Interfaces, Imaging spectroscopy, Extreme ultraviolet, High harmonic generation, Overlay metrology

PROCEEDINGS ARTICLE | April 21, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Coherence imaging, Microscopy, Photons, X-rays, Silicon, Reflectivity, Multiplexing, Phase imaging, Process control, Extreme ultraviolet, Coherent x-ray sources, Defect inspection

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Microscopes, Coherence imaging, Mirrors, X-rays, Inspection, Image resolution, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Showing 5 of 9 publications
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