Dr. Daniel J. Bald
Engineering Manager at Intel Corp
SPIE Involvement:
Publications (9)

Proceedings Article | 5 April 2007 Paper
Proceedings Volume 6518, 65181V (2007) https://doi.org/10.1117/12.712323
KEYWORDS: Data modeling, Performance modeling, Process modeling, Reticles, Etching, Sensors, Metrology, Critical dimension metrology, Manufacturing, Data processing

Proceedings Article | 5 November 2005 Paper
Proceedings Volume 5992, 59921A (2005) https://doi.org/10.1117/12.631637
KEYWORDS: Reticles, Photomasks, Deep ultraviolet, Semiconducting wafers, Atomic force microscopy, Ion beams, Phase shifts, Floods, Printing, Scanners

Proceedings Article | 6 December 2004 Paper
Ted Liang, Eric Frendberg, Daniel Bald, Michael Penn, Alan Stivers
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569210
KEYWORDS: Etching, Quartz, Photomasks, Extreme ultraviolet, Chromium, Scanning electron microscopy, Electron beams, Scanning probe microscopy, Ruthenium, Atomic force microscopy

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569096
KEYWORDS: Inspection, Photomasks, Databases, Semiconducting wafers, Data archive systems, Computer simulations, Image processing, Defect inspection, Lithography, Critical dimension metrology

Proceedings Article | 6 December 2004 Paper
Saghir Munir, Daniel Bald, Vikram Tolani, Horst Haussecker
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569135
KEYWORDS: Scanning electron microscopy, Photomasks, Image segmentation, Metrology, Nonlinear filtering, Semiconducting wafers, Image analysis, Computer aided design, Remote sensing, Databases

Showing 5 of 9 publications
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