Dr. Daniel F. Beale
Research and Development Engineer at Synopsys Inc
SPIE Involvement:
Publications (13)

Proceedings Article | 25 September 2010 Paper
Proceedings Volume 7823, 78233V (2010) https://doi.org/10.1117/12.866040
KEYWORDS: Etching, Data modeling, Optical proximity correction, Process modeling, Calibration, Semiconducting wafers, Photoresist processing, Photomasks, Optical lithography, Signal processing

Proceedings Article | 19 May 2008 Paper
Kyoil Koo, Sooryong Lee, Jason Hwang, Daniel Beale, Matt St. John, Robert Lugg, Seunghee Baek, Munhoe Do, Junghoe Choi, Youngchang Kim, Minjong Hong
Proceedings Volume 7028, 70283E (2008) https://doi.org/10.1117/12.793122
KEYWORDS: Photomasks, Etching, Optical proximity correction, Data modeling, Semiconducting wafers, Lithography, Statistical modeling, Wafer-level optics, Process modeling, Particles

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634921 (2006) https://doi.org/10.1117/12.693080
KEYWORDS: Etching, Optical calibration, Calibration, Scanning electron microscopy, Photomasks, Silicon, Optical proximity correction, Logic, Model-based design, Photoresist processing

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 628334 (2006) https://doi.org/10.1117/12.681822
KEYWORDS: Etching, Scanning electron microscopy, Calibration, Data modeling, Optical proximity correction, Model-based design, Semiconducting wafers, Metrology, Photoresist processing, Plasma etching

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62832T (2006) https://doi.org/10.1117/12.681807
KEYWORDS: Etching, Optical lithography, Process modeling, Manufacturing, Data modeling, Photoresist materials, Semiconducting wafers, Photomasks, Mathematical modeling, Reticles

Showing 5 of 13 publications
  • View contact details

Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top