Dr. Daniel F. Beale
Research and Development Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 25 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Etching, Data modeling, Optical proximity correction, Process modeling, Calibration, Semiconducting wafers, Photoresist processing, Photomasks, Optical lithography, Signal processing

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Photomasks, Etching, Optical proximity correction, Data modeling, Semiconducting wafers, Lithography, Statistical modeling, Wafer-level optics, Process modeling, Particles

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Etching, Optical calibration, Calibration, Scanning electron microscopy, Photomasks, Silicon, Optical proximity correction, Logic, Model-based design, Photoresist processing

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Etching, Scanning electron microscopy, Calibration, Data modeling, Optical proximity correction, Model-based design, Semiconducting wafers, Metrology, Photoresist processing, Plasma etching

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Etching, Optical lithography, Process modeling, Manufacturing, Data modeling, Photoresist materials, Semiconducting wafers, Photomasks, Mathematical modeling, Reticles

Showing 5 of 13 publications
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