Dr. Daniel F. Beale
Research and Development Engineer at Synopsys Inc
SPIE Involvement:
Author
Publications (13)

Proceedings Article | 25 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Optical lithography, Data modeling, Calibration, Etching, Signal processing, Photomasks, Optical proximity correction, Photoresist processing, Semiconducting wafers, Process modeling

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Etching, Particles, Photomasks, Optical proximity correction, Semiconducting wafers, Statistical modeling, Process modeling

Proceedings Article | 20 October 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Logic, Calibration, Etching, Silicon, Scanning electron microscopy, Photomasks, Optical proximity correction, Photoresist processing, Optical calibration, Model-based design

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Metrology, Data modeling, Calibration, Etching, Scanning electron microscopy, Plasma etching, Optical proximity correction, Photoresist processing, Semiconducting wafers, Model-based design

Proceedings Article | 20 May 2006
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Mathematical modeling, Reticles, Optical lithography, Data modeling, Etching, Manufacturing, Photoresist materials, Photomasks, Semiconducting wafers, Process modeling

Showing 5 of 13 publications
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