Daniel P. Ceperley
Research Engineer at SRI International
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | October 30, 2007
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Phase shifting, Finite-difference time-domain method, Polarization, Etching, Glasses, Dielectrics, Photomasks, Electromagnetic simulation, Phase shifts

PROCEEDINGS ARTICLE | March 28, 2007
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Monochromatic aberrations, Etching, Manufacturing, Design for manufacturing, Photomasks, Computer aided design, Process modeling, Device simulation, Chemical mechanical planarization

PROCEEDINGS ARTICLE | October 20, 2006
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Metrology, Error analysis, Scanning electron microscopy, Time metrology, Microelectronics, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | July 7, 2006
Proc. SPIE. 6265, Space Telescopes and Instrumentation I: Optical, Infrared, and Millimeter
KEYWORDS: Diffraction, Stars, Etching, Silicon, Manufacturing, Coronagraphy, Photomasks, Deep reactive ion etching, Planets, Semiconducting wafers

PROCEEDINGS ARTICLE | June 23, 2006
Proc. SPIE. 6271, Modeling, Systems Engineering, and Project Management for Astronomy II
KEYWORDS: Diffraction, Finite-difference time-domain method, Polarization, Silicon, Manufacturing, 3D modeling, Coronagraphy, Near field, Photomasks, Systems modeling

PROCEEDINGS ARTICLE | September 14, 2005
Proc. SPIE. 5905, Techniques and Instrumentation for Detection of Exoplanets II
KEYWORDS: Telescopes, Refractive index, Surface plasmons, Surface plasmon polaritons, Finite-difference time-domain method, Polarization, Coronagraphy, Integrated modeling, Planets, Stray light

Showing 5 of 9 publications
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