Daniel P. Ceperley
Founder & CEO at LeoLabs Inc
SPIE Involvement:
Publications (9)

Proceedings Article | 30 October 2007 Paper
Proceedings Volume 6730, 67301U (2007) https://doi.org/10.1117/12.746805
KEYWORDS: Photomasks, Glasses, Phase shifting, Polarization, Finite-difference time-domain method, Phase shifts, Electromagnetic simulation, Etching, Dielectrics, Diffraction

Proceedings Article | 28 March 2007 Open Access Paper
Andy Neureuther, Wojtek Poppe, Juliet Holwill, Eric Chin, Lynn Wang, Jae-Seok Yang, Marshal Miller, Dan Ceperley, Chris Clifford, Koji Kikuchi, Jihong Choi, Dave Dornfeld, Paul Friedberg, Costas Spanos, John Hoang, Jane Chang, Jerry Hsu, David Graves, Alan Wu, Mike Lieberman
Proceedings Volume 6521, 652104 (2007) https://doi.org/10.1117/12.721199
KEYWORDS: Design for manufacturing, Photomasks, Device simulation, Computer aided design, Process modeling, Etching, Monochromatic aberrations, Manufacturing, Lithography, Chemical mechanical planarization

Proceedings Article | 20 October 2006 Paper
Proceedings Volume 6349, 634947 (2006) https://doi.org/10.1117/12.686957
KEYWORDS: Photomasks, Semiconducting wafers, Metrology, Line edge roughness, Critical dimension metrology, Error analysis, Time metrology, Scanning electron microscopy, Microelectronics, Lithography

Proceedings Article | 7 July 2006 Paper
Proceedings Volume 6265, 62653N (2006) https://doi.org/10.1117/12.673251
KEYWORDS: Photomasks, Silicon, Etching, Coronagraphy, Deep reactive ion etching, Manufacturing, Stars, Semiconducting wafers, Planets, Diffraction

Proceedings Article | 23 June 2006 Paper
Proceedings Volume 6271, 62711F (2006) https://doi.org/10.1117/12.684699
KEYWORDS: 3D modeling, Photomasks, Silicon, Diffraction, Manufacturing, Systems modeling, Polarization, Near field, Coronagraphy, Finite-difference time-domain method

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