Daniel P. Ceperley
Founder & CEO at LeoLabs Inc
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Diffraction, Phase shifting, Finite-difference time-domain method, Polarization, Etching, Glasses, Dielectrics, Photomasks, Electromagnetic simulation, Phase shifts

Proceedings Article | 28 March 2007 Paper
Proc. SPIE. 6521, Design for Manufacturability through Design-Process Integration
KEYWORDS: Lithography, Monochromatic aberrations, Etching, Manufacturing, Design for manufacturing, Photomasks, Computer aided design, Process modeling, Device simulation, Chemical mechanical planarization

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Lithography, Metrology, Error analysis, Scanning electron microscopy, Time metrology, Microelectronics, Photomasks, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 7 July 2006 Paper
Proc. SPIE. 6265, Space Telescopes and Instrumentation I: Optical, Infrared, and Millimeter
KEYWORDS: Diffraction, Stars, Etching, Silicon, Manufacturing, Coronagraphy, Photomasks, Deep reactive ion etching, Planets, Semiconducting wafers

Proceedings Article | 23 June 2006 Paper
Proc. SPIE. 6271, Modeling, Systems Engineering, and Project Management for Astronomy II
KEYWORDS: Diffraction, Finite-difference time-domain method, Polarization, Silicon, Manufacturing, 3D modeling, Coronagraphy, Near field, Photomasks, Systems modeling

Showing 5 of 9 publications
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