Daniel Chalom
Director of Technical Marketing
SPIE Involvement:
Publications (5)

Proceedings Article | 20 October 2016 Paper
Proceedings Volume 10032, 1003205 (2016) https://doi.org/10.1117/12.2247941
KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, SRAF, Inspection, Metals, Optics manufacturing, Scanning electron microscopy, Logic, Lithography

Proceedings Article | 26 September 2016 Paper
Proceedings Volume 9985, 99850R (2016) https://doi.org/10.1117/12.2243407
KEYWORDS: Photomasks, SRAF, Optical proximity correction, Logic, Manufacturing, Metals, Inspection, Image processing, Information operations, Scanning electron microscopy

Proceedings Article | 9 July 2015 Paper
Proceedings Volume 9658, 965805 (2015) https://doi.org/10.1117/12.2196388
KEYWORDS: Photomasks, Metrology, Image registration, Nanofabrication, Calibration, Reticles, Beam shaping, Manufacturing, Lithography, Model-based design

Proceedings Article | 30 September 2009 Paper
Mark Wylie, Trent Hutchinson, Gang Pan, Thomas Vavul, John Miller, Aditya Dayal, Carl Hess, Mike Green, Shad Hedges, Dan Chalom, Maciej Rudzinski, Craig Wood, Jeff McMurran
Proceedings Volume 7488, 74881O (2009) https://doi.org/10.1117/12.830148
KEYWORDS: Photomasks, Reticles, Scanning electron microscopy, Critical dimension metrology, Inspection, Manufacturing, Etching, Error analysis, Semiconducting wafers, Binary data

Proceedings Article | 11 May 2009 Paper
Proceedings Volume 7379, 73790F (2009) https://doi.org/10.1117/12.824256
KEYWORDS: Reticles, Air contamination, Photomasks, Semiconducting wafers, Inspection, Wafer inspection, Semiconductors, Pellicles, Scanners, Manufacturing

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