Daniel Chalom
Director of Technical Marketing at
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | October 20, 2016
Proc. SPIE. 10032, 32nd European Mask and Lithography Conference
KEYWORDS: Lithography, Logic, Metals, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Optics manufacturing

PROCEEDINGS ARTICLE | September 26, 2016
Proc. SPIE. 9985, Photomask Technology 2016
KEYWORDS: Logic, Metals, Image processing, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Information operations

PROCEEDINGS ARTICLE | July 9, 2015
Proc. SPIE. 9658, Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
KEYWORDS: Lithography, Reticles, Metrology, Calibration, Manufacturing, Image registration, Photomasks, Beam shaping, Nanofabrication, Model-based design

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Reticles, Etching, Error analysis, Manufacturing, Inspection, Scanning electron microscopy, Photomasks, Critical dimension metrology, Semiconducting wafers, Binary data

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Semiconductors, Reticles, Air contamination, Scanners, Manufacturing, Inspection, Pellicles, Wafer inspection, Photomasks, Semiconducting wafers

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