Dr. Daniel Connelly
at Univ of California Berkeley
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Optical lithography, Etching, Argon, Silicon, Photoresist materials, Monte Carlo methods, Photomasks, Ion implantation, Wet etching, Semiconducting wafers

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